Intrinsic resputtering in pulsed-laser deposition of lead-zirconate-titanate thin films

9 January 1995

journal article
Published by AIP Publishing in Applied Physics Letters

Vol. 66 (2) , 245-247
https://doi.org/10.1063/1.113560

Abstract

Pulsed-laser deposition (PLD) of lead-zirconate-titanate [Pb(Zrx,Ti1−x)O3] (PZT) thin films under low ambient pressure has been investigated by studying the angular deposition distributions of the constituent elements of the films. Nonstoichiometric profiles are observed and a dip occurs near the target surface normal of the deposition profile of lead. Experimental results show that intrinsic resputtering of the film is important in the PLD process and is responsible for the anomalous distribution of lead.

Keywords

PZT
FILM GROWTH
PULSED LASERS
DEPOSITION
STOICHIOMETRY
CHEMICAL COMPOSITION
DEPTH PROFILES

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