Smooth diamond films grown by hot filament chemical vapor deposition on positively biased silicon substrates
- 1 July 1994
- journal article
- Published by Elsevier in Journal of Crystal Growth
- Vol. 140 (3-4) , 454-458
- https://doi.org/10.1016/0022-0248(94)90328-x
Abstract
No abstract availableKeywords
This publication has 15 references indexed in Scilit:
- Epitaxial diamond thin films on (001) silicon substratesApplied Physics Letters, 1993
- Thin films and devices of diamond, silicon carbide and gallium nitridePhysica B: Condensed Matter, 1993
- Textured growth of diamond on silicon via in situ carburization and bias-enhanced nucleationApplied Physics Letters, 1993
- Nucleation and Selective Deposition of Diamond Thin FilmsPhysica Status Solidi (a), 1992
- Calculated X‐ray Diffraction Data for Diamond PolytypesJournal of the American Ceramic Society, 1992
- Optical characterization of diamondDiamond and Related Materials, 1992
- Generation of diamond nuclei by electric field in plasma chemical vapor depositionApplied Physics Letters, 1991
- Growth of diamond thin films on silicon and TEM observation of the interfaceJournal of Crystal Growth, 1990
- Characterization of diamond films by Raman spectroscopyJournal of Materials Research, 1989
- Growth of diamond thin films by electron assisted chemical vapor depositionApplied Physics Letters, 1985