X-ray lithography for sub-100-nm-channel-length transistors using masks fabricated with conventional photolithography, anisotropic etching, and oblique shadowing
- 1 November 1985
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology B
- Vol. 3 (6) , 1587-1589
- https://doi.org/10.1116/1.582943
Abstract
No abstract availableThis publication has 0 references indexed in Scilit: