Reactive arc vapor ion deposition of TiN, ZrN and HfN
- 1 October 1987
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 153 (1-3) , 75-82
- https://doi.org/10.1016/0040-6090(87)90171-4
Abstract
No abstract availableKeywords
This publication has 19 references indexed in Scilit:
- Characterization of a Ti vacuum arc and the structure of deposited Ti and TiN filmsJournal of Vacuum Science & Technology A, 1987
- A correlation of Auger electron spectroscopy, x‐ray photoelectron spectroscopy, and Rutherford backscattering spectrometry measurements on sputter‐deposited titanium nitride thin filmsJournal of Vacuum Science & Technology A, 1986
- Scratch Adhesion Testing: A CritiqueSurface Engineering, 1986
- TiN coating adhesion studies using the scratch test methodJournal of Vacuum Science & Technology A, 1985
- Problems in the physical vapour deposition of titanium nitrideThin Solid Films, 1985
- Hardness, adhesion and abrasion resistance of TiO2 films on glassThin Solid Films, 1985
- Adhesion studies of ion-plated TiN on steelThin Solid Films, 1981
- Adhesion of Ion Plated Films and Energies of DepositionThe Journal of Adhesion, 1977
- Analysis of the Electrode Products Emitted by dc Arcs in a Vacuum AmbientJournal of Applied Physics, 1969
- Influence of Oxygen on the Adherence of Gold Films to Oxide SubstratesJournal of Applied Physics, 1966