Domain boundaries on {112¯0} planes in GaN: A theoretical study
- 15 December 1998
- journal article
- research article
- Published by American Physical Society (APS) in Physical Review B
- Vol. 58 (23) , 15347-15350
- https://doi.org/10.1103/physrevb.58.15347
Abstract
Local-density-functional methods are used to examine the atomic geometries, energetics, and electrical properties of different models for domain boundaries on {112¯0} planes in wurtzite GaN. In agreement with recent experiments, we find that the energetically most favorable model is characterized by a displacement of and has no inversion of polarity. In this model all atoms at the boundary are fourfold coordinated and form strong Ga-N bonds, which results in a band gap free from deep states. However, our calculations also suggest that electrically active point defects, in particular gallium vacancies, may segregate to the boundary and thus introduce deep acceptor states.
Keywords
This publication has 16 references indexed in Scilit:
- Self-consistent-charge density-functional tight-binding method for simulations of complex materials propertiesPhysical Review B, 1998
- Theory of Ga, N and H terminated GaN surfacesSolid State Communications, 1998
- Direct observation of the core structures of threading dislocations in GaNApplied Physics Letters, 1998
- Theory of Threading Edge and Screw Dislocations in GaNPhysical Review Letters, 1997
- Domain boundaries in epitaxial wurtzite GaNApplied Physics Letters, 1997
- Inversion Domain and Stacking Mismatch Boundaries in GaNPhysical Review Letters, 1996
- Formation of threading defects in GaN wurtzite films grown on nonisomorphic substratesApplied Physics Letters, 1995
- Characterization of structural defects in wurtzite GaN grown on 6H SiC using plasma-enhanced molecular beam epitaxyApplied Physics Letters, 1995
- Microstructural characterization of α-GaN films grown on sapphire by organometallic vapor phase epitaxyApplied Physics Letters, 1995
- Initial stage of aluminum nitride film growth on 6H-silicon carbide by plasma-assisted, gas-source molecular beam epitaxyApplied Physics Letters, 1995