Recognition-Directed Orthogonal Self-Assembly of Polymers and Nanoparticles on Patterned Surfaces
- 15 February 2006
- journal article
- research article
- Published by American Chemical Society (ACS) in Journal of the American Chemical Society
- Vol. 128 (10) , 3162-3163
- https://doi.org/10.1021/ja058686o
Abstract
We demonstrate the patterning of silica substrates with thymine (Thy-PS) and positively charged N-methylpyridinium (PVMP) polymers using photolithography and the subsequent orthogonal modification of these surfaces using diaminopyridine-functionalized polystyrene (DAP-PS) and carboxylate-derivatized CdSe/ZnS core−shell nanoparticles (COO-NP) through diamidopyridine−thymine three-point hydrogen bonding and pyridinium−carboxylate electrostatic interactions, respectively. This two-component orthogonal surface modification was accomplished in a self-sorting, single-step fashion, providing a versatile tool for the rapid and efficient creation of complex materials.Keywords
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