Chlorine and HCl radical beam etching of III–V semiconductors

• 1 November 1990
• journal article
• Published by American Vacuum Society in Journal of Vacuum Science & Technology B
• Vol. 8  (6) , 1951-1955
• https://doi.org/10.1116/1.584881

Abstract

Keywords

• RADICAL BEAM
• HCL RADICAL
• BEAM ETCHING
• SEMICONDUCTORS
• CHLORINE AND HCL