Advanced sacrificial poly-Si technology for fluidic systems
- 21 June 2002
- journal article
- Published by IOP Publishing in Journal of Micromechanics and Microengineering
- Vol. 12 (5) , 621-624
- https://doi.org/10.1088/0960-1317/12/5/317
Abstract
Sacrificial poly-Si etching can be used to create thin cavities and channels. By combining it with anisotropic KOH etching of a mono-Si substrate, important components for fluidic systems, such as V-grooved channels, thin sandwiched channels, channel crossings and membrane filters and injectors, have been fabricated in a single etch step.Keywords
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- Precise mask alignment to the crystallographic orientation of silicon wafers using wet anisotropic etchingJournal of Micromechanics and Microengineering, 1996