Illumination effects on image formation in X-ray proximity printing
- 1 March 1991
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 13 (1-4) , 343-346
- https://doi.org/10.1016/0167-9317(91)90108-p
Abstract
No abstract availableKeywords
This publication has 1 reference indexed in Scilit:
- Computer simulations of resist profiles in x-ray lithographyJournal of Vacuum Science and Technology, 1981