Microstructure and giant magnetoresistance of Co–Cu granular films fabricated under the extremely clean sputtering process
- 1 June 1998
- journal article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 83 (11) , 7004-7006
- https://doi.org/10.1063/1.367625
Abstract
No abstract availableThis publication has 5 references indexed in Scilit:
- Extremely clean sputtering process and microstructural properties of Ni-Fe films fabricated by this processIEEE Transactions on Magnetics, 1995
- Conductivity and magnetoresistance in magnetic granular films (invited)Journal of Applied Physics, 1993
- Theory of giant magnetoresistance in magnetic granular filmsApplied Physics Letters, 1992
- Giant magnetoresistance in nonmultilayer magnetic systemsPhysical Review Letters, 1992
- Giant magnetoresistance in heterogeneous Cu-Co alloysPhysical Review Letters, 1992