Chemical effects in quantitative auger analysis of phosphorus in silicon and silicon dioxide
- 30 September 1980
- journal article
- Published by Elsevier in Applications of Surface Science
- Vol. 6 (1) , 55-61
- https://doi.org/10.1016/0378-5963(80)90055-0
Abstract
No abstract availableKeywords
This publication has 2 references indexed in Scilit:
- Quantitative Auger analysis of ion-implanted boron and arsenic in polycrystalline siliconSurface Science, 1976
- General formalism for quantitative Auger analysisSurface Science, 1975