Reaction of Amorphous Silicon with Cobalt and Nickel Silicides Before Disilicide Formation
- 1 January 1995
- journal article
- Published by Springer Nature in MRS Proceedings
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- Structural relaxation and defect annihilation in pure amorphous siliconPhysical Review B, 1991
- Formation of thin films of CoSi2: Nucleation and diffusion mechanismsThin Solid Films, 1985
- Electrical properties of thin Co2Si, CoSi, and CoSi2 layers grown on evaporated siliconJournal of Electronic Materials, 1984