Fabrication of NbN thin films by reactive sputtering
- 1 May 1993
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology A
- Vol. 11 (3) , 615-620
- https://doi.org/10.1116/1.578780
Abstract
We have fabricated NbN thin films by reactive rf magnetron sputtering. Critical temperatures above 15 K have been achieved by carefully monitoring the deposition parameters of total chamber pressure, rate of Ar and N2 injection, partial pressures of Ar and N2 in the chamber and deposition rate. We found the deposition rate and partial pressure ratios of Ar:N2 to be the key parameters in reliably obtaining high critical temperature thin films. The critical temperature dependence upon total chamber pressure was found to be in general agreement with the scaling law. High quality NbN thin filmmicrostructures were obtained by plasma etching without the degradation of the superconductingproperties of the film.Keywords
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