Raman diffusion profilometry:OH in vitreous SiO2
- 1 March 1981
- journal article
- research article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 38 (5) , 336-338
- https://doi.org/10.1063/1.92361
Abstract
Techniques are described for using Raman spectroscopy to measure the concentration profiles of impurities that have been diffused into transparent host media. Profiles are presented for the diffusion of water into fused silica. Spatial resolutions of 50 mm for concentrations of OH above 180 ppm (by weight) are demonstrated, and order of magnitude improvements over these values are confidently predicted.Keywords
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