Abstract: New x-ray mask of Al–Al2O3 structure

Publisher Website
Google Scholar
Abstract
This paper describes the fabrication and performance of a newly developed x-ray lithography mask consisting of an aluminum substrate and an Al2O3 film which was grown on the aluminum substrate by anodization. Transparent membranes of Al2O3 film were made by chemically etching parts of the aluminum substrate beneath the film on which gold absorber patterns were fabricated. Gold micropatterns were replicated successfully by Al Kα (8.34 Å) x rays. Properties of this mask include ease of fabrication, transparency, feasibility of realignment by optical means, and high mechanical strength allowing the capability of larger window size.

This publication has 0 references indexed in Scilit: