Collective effects in electronic sputtering of organic molecular ions by fast incident cluster ions
- 15 July 1988
- journal article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 64 (2) , 831-834
- https://doi.org/10.1063/1.341933
Abstract
The collective sputtering effect of fast primary cluster ions on the yield of secondary molecular ions has been demonstrated for the first time. Results show that the sputtering yield of valine negative molecular ions per incident carbon atom, in a C+n incident cluster ion, increases with increasing n. The yield results are interpreted as a direct effect of the enhancement in the electronic stopping power per atom in cluster ions compared to atomic ions.This publication has 27 references indexed in Scilit:
- Fast-ion-induced erosion of leucine as a function of the electronic stopping powerPhysical Review B, 1987
- Undulation instability in stripe domain structures of « bubble » materialJournal de Physique, 1987
- Ion-induced desorption in insulators by Hydrogen cluster impact up to 600 KeVRadiation Effects, 1986
- Charge-state distributions of nitrogen ions resulting from the foil-induced dissociation of 4.2-MeVionsPhysical Review A, 1985
- Ion-induced desorption by high-energy (600 keV) hydrogen clustersPhysical Review Letters, 1985
- Charge-State Dependence of Desorption of Biomolecules Induced by Fast Heavy IonsPhysical Review Letters, 1981
- Energy loss of atomic and molecular ion beams in thin foilsNuclear Instruments and Methods, 1976
- New approach to the mass spectroscopy of non-volatile compoundsBiochemical and Biophysical Research Communications, 1974
- Equilibrium Charge Distributions of C, N, Ar, and Fe in CarbonPhysical Review B, 1969
- Equilibrium charge-state fractions of 0.2 to 6.5 MeV helium ions in carbonProceedings of the Physical Society, 1965