The relationship between the effective current density and the effective overpotential in copper deposition by the pulsating potential
- 1 August 1974
- journal article
- Published by Springer Nature in Journal of Applied Electrochemistry
- Vol. 4 (3) , 267-273
- https://doi.org/10.1007/bf01637237
Abstract
No abstract availableKeywords
This publication has 2 references indexed in Scilit:
- Time optimal electrodeposition of metals with a pulsating currentJournal of Applied Electrochemistry, 1973
- The effect of pulsating potential on the morphology of metal deposits obtained by mass-transport controlled electrodepositionJournal of Applied Electrochemistry, 1971