A multichamber single-wafer chemical vapor deposition reactor and electron cyclotron resonance plasma for flexible integrated circuit manufacturing
- 1 March 1991
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
- Vol. 9 (2) , 374-379
- https://doi.org/10.1116/1.585579
Abstract
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