Novel x-ray mask inspection tool based on transmission x-ray conversion microscope
- 27 May 1996
- proceedings article
- Published by SPIE-Intl Soc Optical Eng
- p. 211-220
- https://doi.org/10.1117/12.240473
Abstract
We present the design and preliminary experimental results on a novel x-ray mask inspection tool based on a transmission x-ray secondary electron conversion microscope (TXsecM). The x-ray beam transmitted through the mask impinges onto a high quantum yield photoemissive cathode located at the plane where the wafer will be placed in the stepper. The cathode converts photons into low energy secondary electrons with narrow bandwidth, and the electrons are then imaged by a specially designed low voltage electrostatic lens column with 1200X magnification. Therefore, the micrographs thus obtained represent an accurate map of the x-ray radiation on the resist in an actual production exposure. TXsecM is an ideal tool for x-ray mask inspection as well as image formation analysis in real time. The design goal is to achieve 20nm spatial resolution.Keywords
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