The Nucleation of CVD Silicon on SiO2 and Si3 N 4 Substrates: III . The System at Low Temperatures
- 1 June 1981
- journal article
- Published by The Electrochemical Society in Journal of the Electrochemical Society
- Vol. 128 (6) , 1353-1359
- https://doi.org/10.1149/1.2127635