Influence of substrate temperature on the properties of argon-ion-assisted-deposited CeO2 films
- 1 December 1992
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 221 (1-2) , 214-219
- https://doi.org/10.1016/0040-6090(92)90817-u
Abstract
No abstract availableKeywords
This publication has 18 references indexed in Scilit:
- Influence of substrate temperature on the properties of oxygen-ion-assisted deposited CeO2 filmsJournal of Applied Physics, 1992
- Optical properties of ion assisted deposited CeO2 filmsJournal of Vacuum Science & Technology A, 1991
- Use of ion beam assisted deposition to modify the microstructure and properties of thin filmsInternational Materials Reviews, 1990
- Ion-beam-induced epitaxial vapor-phase growth: A molecular-dynamics studyPhysical Review B, 1987
- Ion-assisted thin film deposition and applicationsVacuum, 1986
- Ion-based methods for optical thin film depositionJournal of Materials Science, 1986
- Properties of CeO_2 thin films prepared by oxygen-ion-assisted depositionApplied Optics, 1985
- Modification of the optical and structural properties of dielectric ZrO2 films by ion-assisted depositionJournal of Applied Physics, 1984
- Determination of the thickness and optical constants of amorphous siliconJournal of Physics E: Scientific Instruments, 1983
- Optical Properties and Structure of Cerium Dioxide FilmsJournal of the Optical Society of America, 1958