A new modular multichamber plasma enhanced chemical vapor deposition system

• 1 June 1993
• journal article
• Published by Elsevier in Applied Surface Science
• Vol. 70-71, 716-721
• https://doi.org/10.1016/0169-4332(93)90608-e

Abstract

Keywords

• PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION
• NEW MODULAR
• MODULAR MULTICHAMBER
• MULTICHAMBER PLASMA
• DEPOSITION SYSTEM