The effect of fabrication variables on chromium thin film resistors
- 1 June 1963
- Vol. 13 (6) , 213-221
- https://doi.org/10.1016/0042-207x(63)90326-9
Abstract
No abstract availableThis publication has 5 references indexed in Scilit:
- Electrodeposition of High-Purity ChromiumJournal of the Electrochemical Society, 1959
- Obtaining Low Orders of Interference in Measuring Film Thicknesses by Multiple Beam InterferometryJournal of the Optical Society of America, 1958
- The mean free path of electrons in metalsAdvances in Physics, 1952
- The Thickness Measurement of Thin Films by Multiple Beam InterferometryJournal of Applied Physics, 1950
- Conduction Processes in Thin Deposits of AntimonyPhysical Review B, 1949