Low‐Pressure Chemical Vapor Deposition of α‐Si3N4 from SiF4 and NH3: Nucleation and Growth Characteristics
- 1 October 1992
- journal article
- Published by Wiley in Journal of the American Ceramic Society
- Vol. 75 (10) , 2803-2808
- https://doi.org/10.1111/j.1151-2916.1992.tb05508.x
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- Low‐Pressure Chemical Vapor Deposition of α‐Si3N4 from SiF4 and NH3: Kinetic CharacteristicsJournal of the American Ceramic Society, 1992
- Nucleation and growth of silicon by CVDJournal of Crystal Growth, 1980
- Chemical vapour-deposited silicon nitrideJournal of Materials Science, 1976
- Chemical vapour-deposited silicon nitrideJournal of Materials Science, 1976