Device Photolithography: An Overview of the New Mask-Making System

• 1 November 1970
• journal article
• website
• Published by Institute of Electrical and Electronics Engineers (IEEE) in Bell System Technical Journal
• Vol. 49  (9) , 1997-2009
• https://doi.org/10.1002/j.1538-7305.1970.tb02507.x

Abstract

Keywords

• DEVICE PHOTOLITHOGRAPHY
• MASK MAKING SYSTEM
• NEW MASK MAKING