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Vapor‐Phase Etching of InP Using Anhydrous HCl and PH 3 Gas
Home
Publications
Vapor‐Phase Etching of InP Using Anhydrous HCl and PH 3 Gas
Vapor‐Phase Etching of InP Using Anhydrous HCl and PH 3 Gas
KP
Kangsa Pak
Kangsa Pak
Yasuo Koide
Yasuo Koide
KI
Kimimasa Imai
Kimimasa Imai
AY
Akira Yoshida
Akira Yoshida
TN
Tetsuro Nakamura
Tetsuro Nakamura
YY
Yukio Yasuda
Yukio Yasuda
TN
Tatau Nishinaga
Tatau Nishinaga
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1 October 1986
journal article
Published by
The Electrochemical Society
in
Journal of the Electrochemical Society
Vol. 133
(10)
,
2204-2205
https://doi.org/10.1149/1.2108370
Abstract
No abstract available
Cited
Cited by 13 articles
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