NURA: a feasible, gas-dielectric interconnect process

23 December 2002

conference paper
Published by Institute of Electrical and Electronics Engineers (IEEE)

p. 82-83
https://doi.org/10.1109/vlsit.1996.507801

Abstract

We have proposed a gas-dielectric interconnect process, and demonstrated its feasibility. While several engineering problems need to tackled before the proposed process is manufacturable, the incentive for further development of this process is huge since it can lead to the minimum physical value of the relative dielectric constant, 1.0.

Keywords

MANUFACTURING PROCESSES
DIELECTRIC CONSTANT

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