Mössbauer study of the microscopic surrounding of co atoms implanted in si and ge below the full amorphization limit

1 January 1982

journal article
research article
Published by Taylor & Francis in Radiation Effects

Vol. 67 (4) , 101-106
https://doi.org/10.1080/01422448208226865

Abstract

Mössbauer spectroscopy on ⁵⁷Co implanted into Si and Ge at doses between 10¹¹ and 10¹⁵ atoms/cm² supports the single track amorphization model. Calculations based on linear cascade theory do not give quantitative agreement with the experiment.

Keywords

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