X-Ray Photoelectron Spectroscopy of Fluorocarbon Films Deposited by RF Sputtering

• 1 November 1993
• journal article
• Published by IOP Publishing in Japanese Journal of Applied Physics
• Vol. 32  (11R) , 5090-5094
• https://doi.org/10.1143/jjap.32.5090

Abstract

Keywords

• STRUCTURE
• DEPOSITED FILMS
• SPUTTERING
• PRESSURE
• POWER
• FLUOROCARBON FILMS