Novel TiO2 CVD films for semiconductor photocatalysis
Top Cited Papers
- 23 August 2002
- journal article
- Published by Elsevier in Journal of Photochemistry and Photobiology A: Chemistry
- Vol. 151 (1-3) , 171-179
- https://doi.org/10.1016/s1010-6030(02)00190-9
Abstract
No abstract availableKeywords
This publication has 18 references indexed in Scilit:
- Hydrophobic drawings on hydrophilic surfaces of single crystalline titanium dioxide: surface wettability control by mechanochemical treatmentSurface Science, 2000
- Titanium dioxide photocatalysisJournal of Photochemistry and Photobiology C: Photochemistry Reviews, 2000
- Photoinduced Surface Reactions on TiO2 and SrTiO3 Films: Photocatalytic Oxidation and Photoinduced HydrophilicityChemistry of Materials, 1999
- Photomineralisation of 4-chlorophenol sensitised by TiO2 thin filmsJournal of Photochemistry and Photobiology A: Chemistry, 1998
- Effect of Ultrasonic Treatment on Highly Hydrophilic TiO2 SurfacesLangmuir, 1998
- An overview of semiconductor photocatalysisPublished by Elsevier ,1998
- Photogeneration of Highly Amphiphilic TiO2 SurfacesAdvanced Materials, 1998
- Efficient TiO2 Powder and Film Photocatalysts with Rutile Crystal StructureChemistry Letters, 1996
- Photooxidative self-cleaning transparent titanium dioxide films on glassJournal of Materials Research, 1995
- Preparation of Transparent TiO2 Thin Film Photocatalyst and Its Photocatalytic ActivityChemistry Letters, 1995