Carrier Reduction in n-GaAs by Cr Ion Implantation

• 1 December 1980
• journal article
• Published by IOP Publishing in Japanese Journal of Applied Physics
• Vol. 19  (12) , L747-L750
• https://doi.org/10.1143/jjap.19.l747

Abstract

Keywords

• SCHOTTKY BARRIER
• ION IMPLANTATION
• DIFFUSION COEFFICIENT