A study of the use of ultraviolet–ozone cleaning for reduction of the defect density on molecular beam epitaxy grown GaAs wafers
- 1 January 1991
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
- Vol. 9 (1) , 132-135
- https://doi.org/10.1116/1.585274
Abstract
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