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AES and XPS analysis of the interaction of Ti with Si and SiO2 during RTA
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Publications
AES and XPS analysis of the interaction of Ti with Si and SiO2 during RTA
AES and XPS analysis of the interaction of Ti with Si and SiO2 during RTA
HB
H. Bender
H. Bender
WC
W.D. Chen
W.D. Chen
JP
J. Portillo
J. Portillo
LH
L. Van Den Hove
L. Van Den Hove
WV
W. Vandervorst
W. Vandervorst
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1 September 1989
journal article
Published by
Elsevier
in
Applied Surface Science
Vol. 38
(1-4)
,
37-47
https://doi.org/10.1016/0169-4332(89)90516-3
Abstract
No abstract available
Cited
Cited by 64 articles
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