Partition of Hydrogen in the Modified Chemical Vapor Deposition Process
- 2 June 1981
- journal article
- Published by Wiley in Journal of the American Ceramic Society
- Vol. 64 (6) , 325-327
- https://doi.org/10.1111/j.1151-2916.1981.tb10296.x
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- Incorporation of OH in Glass in the MCVD ProcessJournal of the American Ceramic Society, 1979
- Thermophoresis: The mass transfer mechanism in modified chemical vapor depositionJournal of Applied Physics, 1979
- A new technique for the preparation of low-loss and graded-index optical fibersProceedings of the IEEE, 1974
- Infrared Study of OH and NH2 Groups on the Surface of a Dry Silica AerogelThe Journal of Physical Chemistry, 1966