Fabrication of sub-100 nm GaAs columns by reactive ion etching using Au islands as etching mask
- 1 January 1995
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
- Vol. 13 (1) , 161-162
- https://doi.org/10.1116/1.587976