Photonic crystal polarisation splitters
- 22 July 1999
- journal article
- Published by Institution of Engineering and Technology (IET) in Electronics Letters
- Vol. 35 (15) , 1271-1272
- https://doi.org/10.1049/el:19990875
Abstract
The design, fabrication, and measurement of an a-Si/SiO2 photonic crystal polarisation splitter are reported. The device consists of a 10-period corrugated multilayer film and is made by a combination of sputter-deposition and sputter-etching processes. The measured insertion loss and extinction ratio at λ = 1.55 µm are 0.4 dB and > 40 dB, respectively.Keywords
This publication has 3 references indexed in Scilit:
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- Fabrication of submicrometre 3D periodic structurescomposed of Si/SiO 2Electronics Letters, 1997
- Photonic crystals: putting a new twist on lightNature, 1997