Characterization of amorphous hydrogenated carbon nitride films prepared by plasma-enhanced chemical vapor deposition using a helical resonator discharge
- 15 July 1997
- journal article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 82 (2) , 658-665
- https://doi.org/10.1063/1.365595
Abstract
No abstract availableThis publication has 30 references indexed in Scilit:
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