Tracer diffusion in amorphous Pd-Cu-Si

Abstract
Systematic measurements of W, Ir, Pt, Au, Hg, Tl, Pb, and Bi tracer diffusion have been performed in melt-spun amorphous Pd78 Cu6 Si16 ribbons. The impurities were introduced by ion implantation, and diffusional changes of the depth profiles were measured by Rutherford backscattering spectrometry. The observed differences in the diffusivities of various ions are discussed and compared with published data.

This publication has 4 references indexed in Scilit: