Polycrystalline ?-C3N4 thin films
- 1 January 1995
- journal article
- Published by Springer Nature in Journal of Materials Science Letters
- Vol. 14 (24) , 1742-1744
- https://doi.org/10.1007/bf00270994
Abstract
No abstract availableKeywords
This publication has 11 references indexed in Scilit:
- Formation of carbon nitride films on Si(100) substrates by electron cyclotron resonance plasma assisted vapor depositionApplied Physics Letters, 1994
- Observation of crystallinePhysical Review B, 1994
- Possibility of carbon nitride formation by low-energy nitrogen implantation into graphite: In situ electron spectroscopy studiesApplied Physics Letters, 1994
- Structural Properties of Amorphous Carbon Nitride Films Prepared by Reactive RF-Magnetron SputteringJapanese Journal of Applied Physics, 1993
- Experimental Realization of the Covalent Solid Carbon NitrideScience, 1993
- Analytical electron microscopy and Raman spectroscopy studies of carbon nitride thin filmsJournal of Vacuum Science & Technology A, 1993
- Structure and bonding studies of the C:N thin films produced by rf sputtering methodJournal of Materials Research, 1990
- Chemical Preparation and Shock Wave Compression of Carbon Nitride PrecursorsJournal of the American Ceramic Society, 1990
- Structural properties and electronic structure of low-compressibility materials: β- and hypothetical β-Physical Review B, 1990
- Prediction of New Low Compressibility SolidsScience, 1989