1.54 μm photoluminescence of Er3+ doped into SiO2 films containing Si nanocrystals: Evidence for energy transfer from Si nanocrystals to Er3+
- 1 September 1997
- journal article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 71 (9) , 1198-1200
- https://doi.org/10.1063/1.119624
Abstract
films containing Si nanocrystals (nc-Si) and Er were prepared and their photoluminescence (PL) properties were studied. The samples exhibited luminescence peaks at 0.81 and 1.54 μm, which could be assigned to the electron-hole recombination in nc-Si and the intra-4 transition in respectively. Correlation between the intensities of the two luminescence peaks was studied as functions of Er concentration and excitation power. The present results clearly demonstrate that excitation of occurs through the recombination of photogenerated carriers spatially confined in nc-Si and the subsequent energy transfer to .
Keywords
This publication has 13 references indexed in Scilit:
- Size-dependent near-infrared photoluminescence spectra of Si nanocrystals embedded in SiO2 matricesSolid State Communications, 1997
- Doping of B atoms into Si nanocrystals prepared by rf cosputteringSolid State Communications, 1996
- Correlation between visible and infrared (1.54 μm) luminescence from Er-implanted porous siliconApplied Physics Letters, 1996
- Raman scattering from acoustic phonons confined in Si nanocrystalsPhysical Review B, 1996
- Optically active erbium centers in siliconPhysical Review B, 1996
- Electroluminescence of erbium–oxygen-doped silicon diodes grown by molecular beam epitaxyApplied Physics Letters, 1996
- A spectroscopic study on the luminescence of Er in porous siliconApplied Physics Letters, 1996
- Strong 1.54 μm luminescence from erbium-doped porous siliconThin Solid Films, 1996
- Origin of the 1.54 μm luminescence of erbium-implanted porous siliconApplied Physics Letters, 1995
- Optical activation and excitation mechanisms of Er implanted in SiPhysical Review B, 1993