Gettering of nickel to cavities in silicon introduced by hydrogen implantation

• 10 April 1995
• journal article
• Published by AIP Publishing in Applied Physics Letters
• Vol. 66  (15) , 1889-1891
• https://doi.org/10.1063/1.113311

Abstract

Keywords

• NICKEL
• TRANSMISSION ELECTRON MICROSCOPY
• CHEMICAL REACTION
• ION IMPLANTATION
• THERMAL ANNEALING