Amplitude and spatial frequency characterization of line-edge roughness using CD-SEM
- 1 July 2002
- proceedings article
- Published by SPIE-Intl Soc Optical Eng
- p. 347-355
- https://doi.org/10.1117/12.473473
Abstract
In this work we describe a simple and easy way to implement line edge roughness measurement using the Applied Materials VeraSEM 3D CD SEM. The outcomes of the measurement are the roughness amplitude and its main spatial wavelength components. In the first step we test this method on an e-beam resist wafer with known roughness and correlate the results with AFM measurements. In the second step, we measured the line roughness of a 193 nm resist FEM wafer. It was found that negative defocus is characterized by long wavelength components while positive defocus shows line roughness at all wavelengths.Keywords
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