Sub-10 nm lithography and development properties of inorganic resist by scanning electron beams
- 1 November 1995
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
- Vol. 13 (6) , 2757-2761
- https://doi.org/10.1116/1.588260
Abstract
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