Chemical relaxation study of the heterogeneous silicon-hydrogen system under plasma conditions
- 1 June 1983
- journal article
- research article
- Published by Springer Nature in Plasma Chemistry and Plasma Processing
- Vol. 3 (2) , 219-234
- https://doi.org/10.1007/bf00566021
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- Kinetic study of the heterogeneous Si/H system under low-pressure plasma conditions by means of mass spectrometryPlasma Chemistry and Plasma Processing, 1982
- Ion and radical reactions in the silane glow discharge deposition of a-Si:H filmsPlasma Chemistry and Plasma Processing, 1982
- Highlights of preparative solid state chemistry in low pressure plasmasPublished by Walter de Gruyter GmbH ,1982
- Reaction mechanisms of the radio frequency glow discharged deposition process in silane-heliumThin Solid Films, 1979