Source optimization for magnetron sputter-deposition of NbTiN tuning elements for SIS THz detectors
- 1 November 1999
- journal article
- Published by IOP Publishing in Superconductor Science and Technology
- Vol. 12 (11) , 736-740
- https://doi.org/10.1088/0953-2048/12/11/314
Abstract
NbTiN is one of the most promising materials for use in the tuning circuits of Nb-based SIS mixers for operating frequencies above the gap frequency of Nb (700 GHz). Device development requires stable and reproducible film properties. In this manuscript we compare the properties of NbTiN films obtained with a sputtering source using balanced and unbalanced magnetic trap configurations. This experiment shows that reducing the effectiveness of the magnetic trap by changing the magnet configuration is equivalent to reducing the sputtering pressure. We also show that it is possible to optimize the configuration of the magnetron magnets to produce stable and reproducible NbTiN films under the same gas pressure and applied power throughout the target lifetime.Keywords
This publication has 11 references indexed in Scilit:
- Properties of DC magnetron sputtered Nb and NbN films for different source conditionsIEEE Transactions on Applied Superconductivity, 1999
- Dependence of critical temperature and resistivity of thin film Nb47wt%Ti on magnetron sputtering conditionsIEEE Transactions on Applied Superconductivity, 1999
- Optimization of RF- and DC-sputtered NbTiN films for integration with Nb-based SIS junctionsIEEE Transactions on Applied Superconductivity, 1999
- Characterization of NbN/AlN/NbN tunnel junctions fabricated without intentional heatingIEEE Transactions on Applied Superconductivity, 1997
- Stress and source conditions of DC magnetron sputtered Nb filmsIEEE Transactions on Applied Superconductivity, 1995
- Surface resistance of epitaxial and polycrystalline NbCN films in submillimeter wave regionIEEE Transactions on Applied Superconductivity, 1993
- Ion-assisting magnetron sources: Principles and usesJournal of Vacuum Science & Technology A, 1990
- Properties of reactively sputtered NbN filmsJournal of Vacuum Science & Technology A, 1990
- Electrical transport, optical properties, and structure of TiN films synthesized by low-energy ion assisted depositionJournal of Applied Physics, 1988
- Properties and microelectronic applications of thin films of refractory metal nitridesJournal of Vacuum Science & Technology A, 1985