Cylindrical magnetron co-sputter etching of copper with applications for solar selective absorbing surfaces

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Abstract
Solar selective absorbing surfaces have been produced on large areas of copper plate seeded by a flux of titanium in a cylindical magnetron co-sputter etching system. Surface oxide on the copper and the introduction of reactive gas during the etching were necessary for production of reproducible textured surfaces. The variation of optical properties and surface morphology as a function of sputter etching conditions has been studied. Optimum selective surfaces have absorptance α∠0.92 and emittance ε∠0.18 at 300 K. Both absorptance and emittance decrease slightly after annealing for thousands of hours at 500 °C in vacuum.

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