Selective deposition of diamond crystals by chemical vapor deposition using a tungsten-filament method
- 7 November 1988
- journal article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 53 (19) , 1815-1817
- https://doi.org/10.1063/1.99789
Abstract
Selective deposition of polycrystalline and single‐crystal diamonds has been achieved on a silicon wafer by chemical vapor deposition from CH4 and H2 gases using a hot‐filament method. The nucleation of diamonds occurs selectively at the sites fabricated by successive roughening and patterned etching of wafers.Keywords
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