Fluorescent micropattern formation on polymer surface by laser ablation
- 9 December 1991
- journal article
- research article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 59 (24) , 3189-3190
- https://doi.org/10.1063/1.105732
Abstract
248-nm laser ablation of poly(methyl methacrylate) plates and soaking of the ablated plates in aqueous solution of rhodamine B resulted in fluorescent micropattern formation. A positive or negative fluorescent pattern of the dye was obtained by controlling the laser fluence. Incorporation mechanism of the dye into the ablated polymer is discussed.Keywords
This publication has 7 references indexed in Scilit:
- Fluorescence characterization of ablated polymeric materials: Poly(methyl methacrylate) doped with 1-ethylpyreneJournal of Applied Physics, 1990
- Foreign Gas Effect upon Excimer Laser Ablation of PolymerMRS Proceedings, 1990
- Polymer surface reactivity enhancement by ultraviolet ArF laser irradiation: An x-ray photoelectron spectroscopy study of polytetrafluoroethylene and polyethyleneterepthalate ultraviolet treated surfacesJournal of Vacuum Science & Technology A, 1989
- Ultraviolet laser ablation of organic polymersChemical Reviews, 1989
- Surface properties of poly(ethylene terephthalate) films modified by far-ultraviolet radiation at 193nm (laser) and 185nm (low intensity)The Journal of Physical Chemistry, 1986
- Mechanism of the ultraviolet laser ablation of polymethyl methacrylate at 193 and 248 nm: laser-induced fluorescence analysis, chemical analysis, and doping studiesJournal of the Optical Society of America B, 1986
- Nature of group Ib metal films deposited on polymer surfaces photooxidized with far-ultraviolet (185 nm) radiationSurface Science, 1983