Electrical properties of thin carbon films obtained by r.f. methane decomposition on an r.f.-powered negatively self-biased electrode
- 1 February 1986
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 136 (2) , 161-166
- https://doi.org/10.1016/0040-6090(86)90276-2
Abstract
No abstract availableThis publication has 12 references indexed in Scilit:
- Crystal structure of diamondlike carbon films prepared by ionized deposition from methane gasJournal of Applied Physics, 1984
- Basic properties of metal/insulator/semiconductor structures containing borazone and diamond layers produced by the reactive pulse plasma methodThin Solid Films, 1983
- rf-plasma deposited amorphous hydrogenated hard carbon thin films: Preparation, properties, and applicationsJournal of Applied Physics, 1983
- Properties of hydrogenated amorphous carbon films and the effects of dopingPhilosophical Magazine Part B, 1982
- Optical properties of hydrogenated hard carbon thin filmsThin Solid Films, 1982
- Structure and properties of quasi-amorphous films prepared by ion beam techniquesThin Solid Films, 1980
- Diamond-like carbon films produced in a butane plasmaThin Solid Films, 1979
- Deposition of hard and insulating carbonaceous films on an r.f. target in a butane plasmaThin Solid Films, 1976
- Positive-ion bombardment of substrates in rf diode glow discharge sputteringJournal of Applied Physics, 1972
- Ion-Beam Deposition of Thin Films of Diamondlike CarbonJournal of Applied Physics, 1971