Influence of OH‐ Concentration and Irradiation on Low‐Temperature Dielectric Loss in Silica Glass
- 1 January 1968
- journal article
- Published by Wiley in Journal of the American Ceramic Society
- Vol. 51 (1) , 57-58
- https://doi.org/10.1111/j.1151-2916.1968.tb11832.x
Abstract
No abstract availableKeywords
This publication has 6 references indexed in Scilit:
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- Ultrasonic Loss in Fused Silica Below 100°KJournal of the American Ceramic Society, 1964
- Temperature dependence of ultrasonic attenuation in fused quartz up to 1 kMc/sPhysics Letters, 1964
- Investigation of Low-Temperature Ultrasonic Absorption in Fast-Neutron Irradiated SiGlassPhysical Review B, 1961
- Ultrasonic Absorption in Fused Silica at Low Temperatures and High FrequenciesJournal of the American Ceramic Society, 1955
- Determination of the Depolarization Factors of Highly Polarized Raman Lines*Journal of the Optical Society of America, 1948